Fairfield University's Dolan School of Business named to Princeton Review's "Best 300 Business Schools: 2011 Edition"
Fairfield University's Charles F. Dolan School of Business is an outstanding business school, according to The Princeton Review. The education services company features the Dolan School in the new 2011 edition of its book, "The Best 300 Business Schools" (Random House/Princeton Review).
In making the annual list, Fairfield joins an impressive nationwide group of graduate business programs, including Boston College, Fordham University, Georgetown and Villanova, as well as Ivy League schools such as Brown, Harvard and Yale.
Norm Solomon, Ph.D., dean of the Dolan School, said he was delighted that the School was named to the exclusive list for the sixth time in a row. "This acknowledgment is especially gratifying because it is based in part on the opinions of our students. I would like to emphasize that they have singled out the faculty yet again for their accessibility and expertise as well as for encouraging 'open-minded dialogue' in the classroom."
The Princeton Review does not rank the business schools in the book on a single hierarchical list from 1 to 300, or name one business school best overall. "We are pleased to recommend Fairfield University to readers of our book and users of our site, www.PrincetonReview.com, as one of the best institutions they could attend to earn an MBA," said Robert Franek, Princeton Review senior vice president of publishing,
In the profile of Fairfield, the Princeton Review editors describe the Dolan School as one that "excels in finance, a strength that dovetails nicely with the School's proximity to America's financial center, New York City." It was noted that "Jesuit traditions and philosophies" are not just slogans at Fairfield, but they are in effect a major attraction to students.
Editors quoted students who said, "The ties with well-placed alumni are invaluable." Professors and alumni are regarded as "valuable resources" for students seeking internships and career opportunities. Students also observed "the placement of the School in relation to key industries/businesses is a particular strength." Employers most likely to hire Dolan MBAs include General Electric, People's Bank, American Skandia, United Technologies, Pitney Bowes, The Common Fund, Bayer Corporation, UBS Warburg, Gartner, Unilever and Pfizer.
In a "Survey Says ... " sidebar in the profile, The Princeton Review lists topics that Dolan School students it surveyed were in most agreement about. (The surveys were conducted during the 2009-10, 2008-09, and 2007-08 academic years.) That list includes: "Good peer network" and "Solid preparation in Finance and Accounting".
Graduate programs in the Dolan School include the MBA program, and master's degree programs in accounting, finance, and taxation, as well as certificate programs for advanced study. For more information, visit www.fairfield.edu/mba.
Fairfield University will host a Graduate Information Session Wednesday, Nov. 3 where prospective students will be able to meet deans, faculty and alumni to learn details about the many features and benefits of master's programs and admission criteria. Representatives from Fairfield's Financial Aid office will also be on hand to provide important information on the many ways to finance a graduate education. The event will be held on campus at the Kelley Center from 5:30 p.m.-7:00 p.m. It will highlight 19 graduate programs offered in business (MBA, finance, taxation and accounting,) American studies, engineering (electrical and computer, software, mechanical and management of technology), mathematics, nursing (DNP - Doctorate of nursing practice, nurse anesthesia, family and psychiatric nurse practitioner, clinical nurse leader), the MFA in creative writing and M.A. in communication.
Image: The Dolan School of Business was included in the Princeton Review's new book, "The Best 300 Business Schools" Pictured is the 'BEST' Classroom, just one of the many opportunities for students at the School.
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Posted on October 15, 2010
Vol. 43, No. 79