Fairfield University's Theatre Fairfield presents "dis/connect"


"It's time to stop the clutter and pay attention to our surroundings," says Jon Micheels Leiseth, assistant professor of drama at Fairfield University. Leiseth and his collaborators, a team comprised of student and professional artists have done exactly that with "dis/connect," an original work that explores "fundamental human connection (and lack thereof)" as the final production of Theatre Fairfield's season. This piece of devised theater will be presented at the PepsiCo Theatre Wednesday, April 16 through Sunday, April 20. Performances are at 8 p.m. on Wednesday, Thursday, Friday and Sunday. There are matinee performances at 2 p.m. on Saturday and Sunday. There is no Saturday evening performance; the audience is invited to participate in an after-show discussion with the cast on Thursday, April 17 and Saturday, April 19 after the matinee. Tickets are $5 for students, $6 for seniors and university staff and $12 for general admission.

Leiseth held auditions in early September for "dis/connect" to allow the cast the school year to discover the essentials of the incipient idea of exploring human connection in a world of faster and faster paced rhythms brought on by an increasing dependence on technology. The cast discovered in the rehearsal room as Leiseth notes, "we needed to more closely examine identity and presence as they both play integral roles in human interaction."

The product of the year's labors became, as described by Leiseth, "... a call to fuller presence in one actual place and at one time and in one wholly-integrated self."

This adventurous company invites the public to participate in their journey by being present at a performance.

Tickets are available online at www.quickcenter.com or by calling (203) 254-4010. The toll free number is 1-800-ARTS-396. For more information, please visit the website at www.quickcenter.com.

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Media Contact: Joan Grant, (203) 254-4000, ext. 2950, jgrant@fairfield.edu

Posted on April 1, 2008

Vol. 40, No. 225